Industry Solutions

Semiconductor Fabrication

High-Vacuum Compatible Systems

Anorad is the undisputed leader in vacuum positioning applications. Our ultra-precision systems are designed from the bottom up to meet the vacuum compatible, sub-micron positioning requirements of semiconductor equipment manufacturers. Anorad products are routinely employed in many facets of the industry, including electron-beam lithography, scanning electron microscopy, and focused ion beam diagnostics.

Examples of Anorad's Vacuum Compatible Solutions

Focused Ion Beam Inspection

• Cost effective XY Θ 300mm positioning solutions using vacuum prepped standard stages
• Piezo ceramic linear motors offer zero-dither nanometer-level position stability
• Teflon jacketed cables, fluxless soldered connectors and low vapor pressure lubricant cleanly operate to 10^-7 Torr
• Vented hardware, air cavities free, and non-porous electroless nickel finish enable rapid pump down
• Recirculating element bearings allow compact profile and small footprint

Scanning Electron Beam Lithography Stage

• Nonmagnetic XY positioning stage for nanometer lithography processes
• External linear servo motor drives with through-chamber pushrods provide high dynamic response with extremely low stray magnetic fields
• Thermally stable Zerodur® workpiece support plate with integral plane mirrors laser interferometer position feedback enables image placement accuracy of better than 0.05mm
• Suitable for writing reticles, optical phase shift masks, 1x X-ray masks and sub-micron direct write

Lithography Processes

• Proof of concept Scattering with Angular Limitation in Projection Electron beam Lithography (SCALPEL)
• System uses Anorad stages for mask and wafer motion

Scanning Electron Beam Inspection Stage

Open frame construction allows double-sided work piece access for inspection of wafers and X-ray masks

• Dual vacuum compatible brushless linear servo motor drive enables scanning speed position error of < 0.2µm
• High-precision stage construction with crossed roller bearings enables defect detection as small as 0.005µm
• Constructed using nonmagnetic and vacuum compatible materials for operation to 10^-7 Torr
• Magnetic field variation at E-beam/wafer intersection of < 1 milligauss

Reticle Inspection / Defect Review

• XY vacuum compatible stage for 300 mm SEM defect review
• Piezoelectric locking system for nanometer-level stability
• Rigid aluminum construction minimizes Abbe error
• Glass scale encoders and interpolators for 1 nm resolution

PCLM Stages for High Vacuum

• Nonmagnetic piezo actuated 6-axis positioning stage
• Integral tip and tilt wafer leveling axes for ion beam lithography
• Carefully selected surface finishes, hardware and materials for rapid pump down times

Focused Ion Beam Lithography

• Precision XY vacuum compatible positioning system
• Nonmagnetic piezo ceramic linear motors minimize heat generation
• Electroless nickel plated finish
• Assembled in a cleanroom by gloved technicians and baked-out prior to shipment