Semiconductor "Front End"

Vacuum Compatible Stages for Wafer Lithography

Anorad is the undisputed leader in vacuum positioning applications. Our ultra-precision systems are designed from the bottom up to meet the vacuum compatible, sub-micron positioning requirements of semiconductor equipment manufacturers. Anorad products are routinely employed in many facets of the industry, including electron-beam lithography, scanning electron microscopy, and focused ion beam diagnostics.

Lithography Processes

• Proof of concept Scattering with Angular Limitation in Projection Electron beam Lithography (SCALPEL)
• System uses Anorad stages for mask and wafer motion

Focused Ion Beam Lithography

• Precision XY vacuum compatible positioning system
• Nonmagnetic piezo ceramic linear motors minimize heat generation
• Electroless nickel plated finish
• Assembled in a cleanroom by gloved technicians andbaked-out prior to shipment

Scanning Electron Beam Lithography Stage

• Nonmagnetic XY positioning stage for nanometer lithography processes
• External linear servo motor drives with through-chamber pushrods provide high dynamic response with extremely low stray magnetic fields
• Thermally stable Zerodur® workpiece support plate with integral plane mirrors laser interferometer position feedback enables image placement accuracy of better than 0.05µ m
• Suitable for writing reticles, optical phase shift masks, one time X-ray masks and sub-micron direct write